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عنوان
Dustry plasmas : physics, chemistry and technological impacts in plasma processing
پدید آورنده
edited by Andre Bouchoule
موضوع
Plasma engineering , Plasma )Ionized gases( , Dusty Plasmas , Plasma chemistry , Plasma-enhanced chemical vapor deposition
رده
TA
2020
.
D88
1999
کتابخانه
Central Library of Amirkabir University of Technology
محل استقرار
استان:
Tehran
ـ شهر:
Tehran
تماس با کتابخانه :
۶۶۴۰۷۴۱۸(۰۲۱) – ۶۴۵۴۲۳۴۹(۰۲۱)
CE
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Dustry plasmas : physics, chemistry and technological impacts in plasma processing
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Chichester
Name of Publisher, Distributor, etc.
Wiley
Date of Publication, Distribution, etc.
1999
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
viii, 408 p.: ill
GENERAL NOTES
Text of Note
Includes bibliographies and indexes
TOPICAL NAME USED AS SUBJECT
Entry Element
Plasma engineering
Entry Element
Plasma )Ionized gases(
Entry Element
Dusty Plasmas
Entry Element
Plasma chemistry
Entry Element
Plasma-enhanced chemical vapor deposition
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TA
Book number
2020
Classification Record Number
.
D88
1999
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
TI
Entry Element
edited by Andre Bouchoule
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