عنوان
پدید آورنده
موضوع
رده
TA 2020 .D88 1999
TA
2020
.
D88
1999
کتابخانه
محل استقرار
CE
Dustry plasmas : physics, chemistry and technological impacts in plasma processing
Chichester
Wiley
1999
viii, 408 p.: ill
Includes bibliographies and indexes
Plasma engineering
Plasma )Ionized gases(
Dusty Plasmas
Plasma chemistry
Plasma-enhanced chemical vapor deposition
TA
2020
.
D88
1999
TI
edited by Andre Bouchoule
