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عنوان
Principles of plasma discharges and materials processing
پدید آورنده
/ Michael A. Lieberman, Allan J. Lichtenberg
موضوع
Plasma dynamics,Thin films- Surfaces,Plasma etching,Plasma chemistry- Industrial applications
رده
QC718
.
5
.
D9
,
L54
2005
کتابخانه
Central Library and Documents Center of Mazandaran University
محل استقرار
استان:
Mazandaran
ـ شهر:
Babolsar
تماس با کتابخانه :
62
-
35302861
-
011
INTERNATIONAL STANDARD BOOK NUMBER
(Number (ISBN
0471720011
NATIONAL BIBLIOGRAPHY NUMBER
Number
25051
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
eng
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Principles of plasma discharges and materials processing
First Statement of Responsibility
/ Michael A. Lieberman, Allan J. Lichtenberg
EDITION STATEMENT
Edition Statement
2nd ed.
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Hoboken, N.J
Name of Publisher, Distributor, etc.
: .Wiley-Interscience
Date of Publication, Distribution, etc.
,c2005.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xxxv, 757 p
Other Physical Details
. ill. 25 cm.
GENERAL NOTES
Text of Note
Language: انگلیسی
NOTES PERTAINING TO PUBLICATION, DISTRIBUTION, ETC.
Text of Note
Print
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliographical references (p. 735-748) and index.
TOPICAL NAME USED AS SUBJECT
Entry Element
Plasma dynamics
Entry Element
Thin films- Surfaces
Entry Element
Plasma etching
Entry Element
Plasma chemistry- Industrial applications
DEWEY DECIMAL CLASSIFICATION
Number
530
.
4
.
4
PERSONAL NAME - PRIMARY RESPONSIBILITY
Lieberman, M. A.(Michael A.)
PERSONAL NAME - SECONDARY RESPONSIBILITY
Lichtenberg, Allan J
old catalog
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