Papers from the 40th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication: 28-31 May 1996, Atlanta Marriott Marqurs, Atlanta, Georgia
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
New York
Name of Publisher, Distributor, etc.
Published by the American Vacuum Society through the American Institute of Physics
Date of Publication, Distribution, etc.
1996
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
p. ]3619[-4379: ill.; 28 cm
SERIES
Series Title
Journal of vacuum science & technology B, and in a special casebound edition available to participants
ISSN of Series
vol.14, no.6
GENERAL NOTES
Text of Note
Includes bibliographical references and indexes
TOPICAL NAME USED AS SUBJECT
Entry Element
Congresses ، Photolithography
Entry Element
Congresses ، Lithography, Electron beam
Entry Element
Congresses ، Ion beam lithography
Entry Element
Congresses ، Nanotechnology
LIBRARY OF CONGRESS CLASSIFICATION
Class number
QC
166
.
A1
.
I55
1996
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
AU
Entry Element
sponsored by the American Vacuum Society in cooperation with the Electron Device Society of the Institute of Electrical and Electronics Engineers and the Optical Society of America; special editor for the proceedings: Stella W. Pang
AU .W alletS ,gnaP
CO American Vacuum Society
CO IEEE Electron Devices Society
CO Optical Society of America
TI
SE
CORPORATE BODY NAME - SECONDARY RESPONSIBILITY
Entry Element
International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication )40th: 1996: Atlanta, Georgia(