عنوان

EUV sources for lithography

شابک

0819458457

شابک

1615837167 (electronic bk.)

شابک

9780819458452

شابک

9781615837168 (electronic bk.)

شماره

b503545

عنوان اصلي

EUV sources for lithography

نام عام مواد

[Book]

نام نخستين پديدآور

[edited by] Vivek Bakshi.

محل نشرو پخش و غیره

Bellingham, Wash. :

نام ناشر، پخش کننده و غيره

SPIE Press,

تاریخ نشرو بخش و غیره

c2006.

نام خاص و کميت اثر

1 online resource (xxxv, 1057 p.) :

ساير جزييات

ill.

متن يادداشت

Includes bibliographical references and index.

متن يادداشت

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

منبع سفارش / آدرس اشتراک

Knovel Corporation

عنوان

EUV sources for lithography.

شماره استاندارد بين المللي کتاب و موسيقي

0819458457

موضوع مستند نشده

Extreme ultraviolet lithography.

موضوع مستند نشده

Lithography.

موضوع مستند نشده

Plasma (Ionized gases)

موضوع مستند نشده

Ultraviolet radiation-- Industrial applications.

شماره

ويراست

شماره رده

نشانه اثر

مستند نام اشخاص تاييد نشده

Bakshi, Vivek.

مستند نام تنالگان تاييد نشده

Knovel (Firm)

تاريخ عمليات

20131119111957.0

نام الکترونيکي

نوع ماده

[Book]

تكميل شده

Y