Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices.
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SUMMARY OR ABSTRACT
Text of Note
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.
ACQUISITION INFORMATION NOTE
Source for Acquisition/Subscription Address
Elsevier Science & Technology
Stock Number
81576:81576
OTHER EDITION IN ANOTHER MEDIUM
Title
Plasma deposition of amorphous silicon-based materials.
International Standard Book Number
9780121379407
TOPICAL NAME USED AS SUBJECT
Amorphous semiconductors-- Design and construction.
Plasma-enhanced chemical vapor deposition.
Silicon alloys.
Amorphous semiconductors-- Design and construction.