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Dusty plasmas: physics, chemistry, and technological impacts in plasma processing
پدید آورنده
edited by Andre Bouchoule
موضوع
، Plasma engineering,، Plasma )Ionized gases- Industrial applications,، Dusty plasmas,، Plasma chemistry,، Plasma-enhanced chemical vapor deposition
رده
TA
2020
.
D88
1999
کتابخانه
Library and Documentation Center of Kurdistan University
محل استقرار
استان:
Kurdistan
ـ شهر:
Sanandaj
تماس با کتابخانه :
33624006
-
087
OTHER STANDARD IDENTIFIER
Standard Number
13804
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Dusty plasmas: physics, chemistry, and technological impacts in plasma processing
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Chichester ;New York
Name of Publisher, Distributor, etc.
Wiley
Date of Publication, Distribution, etc.
1999
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
viii, 408 p.:ill.;24 cm
GENERAL NOTES
Text of Note
Includes bibliographical references and indexes
TOPICAL NAME USED AS SUBJECT
Entry Element
، Plasma engineering
Entry Element
، Plasma )Ionized gases- Industrial applications
Entry Element
، Dusty plasmas
Entry Element
، Plasma chemistry
Entry Element
، Plasma-enhanced chemical vapor deposition
DEWEY DECIMAL CLASSIFICATION
Number
660
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TA
2020
.
D88
1999
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
TI
Entry Element
edited by Andre Bouchoule
AU erdnA ,eluohcuoB
LOCATION AND CALL NUMBER
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