Terahertz RF Transistor Technology Based on Graphene and GaN Channel Materials System
نام عام مواد
[Thesis]
نام نخستين پديدآور
Nazir Hossain, Abu Hena Muhammad
نام ساير پديدآوران
Margala, Martin
وضعیت نشر و پخش و غیره
نام ناشر، پخش کننده و غيره
University of Massachusetts Lowell
تاریخ نشرو بخش و غیره
2020
مشخصات ظاهری
نام خاص و کميت اثر
80
یادداشتهای مربوط به پایان نامه ها
جزئيات پايان نامه و نوع درجه آن
Ph.D.
کسي که مدرک را اعطا کرده
University of Massachusetts Lowell
امتياز متن
2020
یادداشتهای مربوط به خلاصه یا چکیده
متن يادداشت
In recent years, there is growing interest in the research and development of solid state-based Terahertz (THz) devices and applications. Within the last two decades, THz applications have become more and more important in various areas such as medical imaging, biological and genomic studies, security screening, pharmaceutical industry, industrial quality control, atmospheric/space studies and so on. As the frequency gets into the Terahertz region, it is able to lead the communication systems with much higher data rates. In my research work, I studied the graphene and III-nitride based device structure to explore the feasibility of terahertz electronic device system. Graphene has regarded as an ideal candidate channel material for the radio frequency flexible electronics. Graphene is one of emerging electronics material which has highest carrier mobility, high saturation velocity, high critical current densities, and single atom thick layered with the highest projected cut-off frequency around 1-30 THz. However, the fabrication process of THz graphene transistor is extremely challenging due to the undesirable defect into the graphene lattice. In this novel work, we present the experimental result of electric field distribution of in-plane graphene structure by investigating the IV-CV measurements at room temperature. In addition, we studied the Raman spectroscopy at 532nm, and correlative analysis of energy selective backscattered electrons mapping taken by ESB detector and the secondary electrons image acquired by the In-Lens detector at different energy level to confirm the graphene layer present on specific location and the layer thickness. The experimental results show that the capacitance coupling between two electrodes is 450 fFmm-1 at 0.18V potential difference. The in plane gated transistor based of GaN/SiC provide better RF performances. For the first time, I developed in plane transistor technology which provide broad transconductance to ensure the higher linear operation frequency range from 90GHz to 250GHz. In my investigation, I have shown that for the GaN/SiC in plane technology can provide sufficient output power 30dBm at third order intercept point.
موضوع (اسم عام یاعبارت اسمی عام)
موضوع مستند نشده
Electrical engineering
موضوع مستند نشده
Materials science
نام شخص به منزله سر شناسه - (مسئولیت معنوی درجه اول )