A cerebrospinal fluid (CSF) shunt system is used for treatment of hydrocephalus and abnormal intracranial pressure (ICP) conditions. Mostly a shunt system is placed under skin for creating a low resistance pathway between intracranial space and appropriate discharge sites within body by doing so excess CSF volume can exit the intracranial space. Displaced intracranial CSF volume normally results in lowered ICP. Thereby, a CSF shunt can manage ICP. In a healthy person, normal ICP is primarily maintained by CSF production and reabsorption rate as a natural tendency of body. If intracranial CSF volume starts increasing due to under reabsorption, this mostly results in raised ICP. Abnormal ICP can be treated by discharging excess CSF volume via use of a shunt system. Once a shunt system is placed subcutaneously, a patient is expected to live a normal life. However, shunt failure as well as flow regulatory problems are major issues with current passive shunt systems which leaves patients with serious consequences of under-/over CSF drainage condition. In this research, a shunt system is developed which is resistant to most shunt-related causes of under-/over CSF drainage. This has been made possible via use of an on-board medical monitoring (diagnostic) and active flow control mechanism. The developed shunt system, in this research, has full external ventricular drainage (EVD) capability. Further miniaturization will make it possible for an implantable shunt.