NATO ASI series., Series E,, Applied sciences ;, 139.
1. In-Situ Processing Combining MBE, Lithography and Ion-Implantation --; 2. Motivations and Early Demonstrations for In-Situ Processings For III-V Semiconductor Devices --; 3. Laser Etching and Microelectronic Applications --; 4. Laser-Induced Chemical Processing of Materials --; 5. High Technology Manufacturing: Critical Issues for the Future --; 6. Ultra High Vacuum Processing: MBE --; 7. Epitaxial Growth of III-V Materials on Implanted III-V Substrates --; 8. Mechanisms of Laser-Induced Deposition from the Gas Phase --; 9. Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition of Platinum --; 10. Excimer Laser Projection Patterning --; 11. Excimer Laser Patterning and Etching of Metals --; 12. Ion Projection Lithography --; 13. UV Light-Assisted Deposition of A1 on Si from TMA --; 14. E-Beam Induced Decomposition of Inorganic Solids --; 15. Electronic Connection Through Silicon Wafers --; 16. The Development and Use of Novel Precursors for Photolytic Deposition of Dielectric Films --; 17. Focused Ion Beam Induced Deposition --; 18. Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks --; 19. Confirmation of the Wavelength Dependence of Silicon Oxidation Induced By Visible Radiation --; 20. Focused Ion Beam Technology and Applications --; 21. Laser Direct Writing for Device Applications --; 22. Laser-Induced Photoetching of Semiconductors with Chlorine --; 23. Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication --; 24. Synthesis and Characterization of Laser Driven Powders --; 25. Physical Properties of Laser Written Chromium Oxide Thin Films --; 26. UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime --; 27. Laser Assisted Plasma Etching of Silicon Dioxide --; 28. Nd: Yag Laser Processing for Circuit modification and Direct Writing of Silicon Conductors --; 29. Study of Excimer laser Enhanced Etching of Copper and Silicon With (SUB) Monolayer Coverages of Chlorine --; 30. Surface Chemical Probes and Their Application to the Study of In Situ Semicmductor Processing.
Proceedings of the NATO Advanced Research Workshop, Cargèse, France, May 4-8, 1987