عنوان

Developments in surface contamination and cleaning

شابک

1282737783

شابک

1437778305

شابک

9781282737785

شابک

9781437778304

شماره

b549027

عنوان اصلي

Developments in surface contamination and cleaning

نام عام مواد

[Book]

نام نخستين پديدآور

edited by Rajiv Kohli and Kashmiri L. Mittal.

محل نشرو پخش و غیره

Norwich, NY, U.S.A.

نام ناشر، پخش کننده و غيره

W. Andrew Pub.

تاریخ نشرو بخش و غیره

©2008-

متن يادداشت

Particle Deposition onto Enclosure Surfaces; Contamination Control: A Systems Approach; Particles in Semiconductor Processing; Continuous Contamination Monitoring Systems; Strippable Coatings for Removal of Surface Contaminants; Ultrasonic Cleaning. [V. 1.] Fundamentals and applied aspects --;v. 2. Particle deposition, control and removal.

متن يادداشت

Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination Covers contamination and cleaning issues at the nanoscale Includes an in-depth look at ultrasonic cleaning.

موضوع مستند نشده

Particles -- Measurement.

موضوع مستند نشده

Surface contamination -- Prevention.

موضوع مستند نشده

Surfaces (Technology) -- Inspection.

مستند نام اشخاص تاييد نشده

edited by Rajiv Kohli and Kashmiri L. Mittal.

مستند نام اشخاص تاييد نشده

K L Mittal

مستند نام اشخاص تاييد نشده

Rajiv Kohli

نام الکترونيکي

نوع ماده

[Book]

تكميل شده

Y