عنوان

Resolution enhancement techniques in optical lithography

شابک

0819478814

شابک

9780819478818

شابک اشتباه

0819439959

شابک اشتباه

9780819439956

شماره

dltt

عنوان اصلي

Resolution enhancement techniques in optical lithography

نام عام مواد

[Book]

نام نخستين پديدآور

Alfred Kwok-Kit Wong.

محل نشرو پخش و غیره

Bellingham, Wash. :

نام ناشر، پخش کننده و غيره

SPIE,

تاریخ نشرو بخش و غیره

2001.

نام خاص و کميت اثر

1 online resource (xvii, 214 p. :

ساير جزييات

ill.)

عنوان فروست

Tutorial texts in optical engineering ;

شاپا ي ISSN فروست

v. TT 47

متن يادداشت

Title from PDF t.p. (viewed Aug. 22, 2009).

متن يادداشت

Includes bibliographical references (p. 189-208) and index.

متن يادداشت

Foreword -- Preface-- List of symbols -- 1. Introduction. 1.1 Brief history of printing and lithography. 1.2 Optical lithography and integrated circuits. 1.3 Basics of optical lithography. 1.4 Requirements of microlithography. 1.5 Nonoptical microlithography techniques. 1.6 Current challenges of optical microlithography. 1.7 Three parameters affecting resolution. 1.8 Scope of discussion -- 2. Optical imaging and resolution. 2.1 Coherent imaging. 2.2 Mask spectrum. 2.3 Partially coherent imaging. 2.4 Complex degree of coherence. 2.5 Rayleigh's resolution limit. 2.6 Lithography resolution limit. 2.7 Quantification of image quality. -- 3. Modified illumination. 3.1 Partial coherence factor. 3.2 Off-axis illumination. 3.3 General guidelines -- 4. Optical proximity correction. 4.1 Image distortion. 4.2 Optical proximity correction approaches. 4.3 Numerical techniques. 4.4 Implementation. 4.5 Discussion -- 5. Alternating phase-shifting mask. 5.1 Principle. 5.2 Mask making process. 5.3 Issues. 5.4 Implementation. 5.5 Summary -- 6. Attenuated phase-shift mask. 6.1 Principle. 6.2 Mask making. 6.3 Discussion -- 7. Selecting appropriate RETs. 7.1 Critical levels. 7.2 Methodology. 7.3 Optimization results. 7.4 Summary and discussion -- 8 Second-Generation RETs. 8.1 Multiple exposure. 8.2 Pupil filtering. 8.3 Advanced illumination scheme. 8.4 Compensating process. 8.5 Mask and photoresist tone -- Concluding remarks -- k1 conversion charts -- Bibliography -- Index.

بدون عنوان

0

متن يادداشت

Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.

شماره استاندارد بين المللي کتاب و موسيقي

0819439959

موضوع مستند نشده

Integrated circuits-- Design and construction.

موضوع مستند نشده

Microlithography.

مستند نام اشخاص تاييد نشده

Wong, Alfred Kwok-Kit.

مستند نام تنالگان تاييد نشده

Society of Photo-optical Instrumentation Engineers.

تاريخ عمليات

20110504134237.0

نام الکترونيکي

نوع ماده

[Book]

تكميل شده

Y