SiGe and Si strained-layer epitaxy for silicon heterostructure devices
General Material Designation
[Book]
First Statement of Responsibility
/ edited by John D. Cressler
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Boca Raton
Name of Publisher, Distributor, etc.
: CRC Press/Taylor & Francis,
Date of Publication, Distribution, etc.
, c2008.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
264 p.
Other Physical Details
: ill.
GENERAL NOTES
Text of Note
"The material was previously published in Silicon heterostructure handbook : materials, fabrication, devices, circuits and applications of SiGe and Si strained-layer epitaxy, Taylor and Francis, 2005"--T.p. verso.
NOTES PERTAINING TO PUBLICATION, DISTRIBUTION, ETC.
Text of Note
Print - Electronic
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliographical references and index.
OTHER VARIANT TITLES
Variant Title
Silicon heterostructure handbook
TOPICAL NAME USED AS SUBJECT
Bipolar transistors--Materials
Heterostructures.
Silicon--Electric properties
Epitaxy.
PERSONAL NAME - SECONDARY RESPONSIBILITY
Cressler, John D
ORIGINATING SOURCE
Country
ایران
ELECTRONIC LOCATION AND ACCESS
Host name
SiGe and Si strained-layer epitaxy for silicon heterostructure devices