عنوان

Advanced processes for 193-nm immersion lithography /

شابک

0819478431

شابک

9780819478436

شابک اشتباه

0819475572

شابک اشتباه

9780819475572

شماره

b700646

عنوان اصلي

Advanced processes for 193-nm immersion lithography /

نام عام مواد

[Book]

نام نخستين پديدآور

Yayi Wei, Robert L. Brainard.

محل نشرو پخش و غیره

Bellingham, Wash. :

نام ناشر، پخش کننده و غيره

SPIE,

تاریخ نشرو بخش و غیره

©2009.

نام خاص و کميت اثر

1 online resource (xix, 315 pages) :

ساير جزييات

illustrations

عنوان فروست

SPIE Press monograph ;

مشخصه جلد

PM189

متن يادداشت

"SPIE digital library."

متن يادداشت

Includes bibliographical references and index.

متن يادداشت

Immersion lithography and its challenges -- Process steps in the track -- Resist leaching and water uptake -- Contact angle of water on resist stacks -- Topcoat and resist processes for immersion lithography -- Immersion defects and defect-reduction strategies -- Antireflection coatings and underlayer technology -- Resist shrink and trim processes -- Double exposure and double patterning -- Line-edge roughness of resist patterns -- Extendibility of 193-nm immersion lithography.

بدون عنوان

0

متن يادداشت

This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning.

عنوان

Advanced processes for 193-nm immersion lithography.

شماره استاندارد بين المللي کتاب و موسيقي

0819475572

موضوع مستند نشده

Immersion lithography.

موضوع مستند نشده

Integrated circuits-- Design and construction.

موضوع مستند نشده

Semiconductors-- Etching.

موضوع مستند نشده

Immersion lithography.

موضوع مستند نشده

Integrated circuits-- Design and construction.

موضوع مستند نشده

Semiconductors-- Etching.

شماره

ويراست

شماره رده

نشانه اثر

مستند نام اشخاص تاييد نشده

Wei, Yayi.

مستند نام اشخاص تاييد نشده

Brainard, Robert L.

مستند نام تنالگان تاييد نشده

Society of Photo-optical Instrumentation Engineers.

تاريخ عمليات

20201207162711.0

قواعد فهرست نويسي ( بخش توصيفي )

pn

نام الکترونيکي

نوع ماده

[Book]

تكميل شده

Y