2002 7th International Symposium on Plasma- and Process-Induced Damage
First Statement of Responsibility
Terence Hook, Koji Eriguchi, and Calvin T. Gabriel, editors ; technical co-sponsors, AVS, IEEE/Electron Devices Society, Japanese Society of Applied Physics
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Santa Clara, California
Name of Publisher, Distributor, etc.
AVS
Date of Publication, Distribution, etc.
,c2002
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
]6[, i, 177 p. ill. 28 cm.
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
June 5-7, 2002, Maui, Hawaii, USA
NOTES PERTAINING TO BINDING AND AVAILABILITY
Text of Note
غیرمرجع
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliographic references and author index.
TOPICAL NAME USED AS SUBJECT
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Semiconductor wafers- Congresses
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Semiconductors- Effect of radiation on- Congresses
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Plasma radiation- Congresses
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TK
Book number
7871
.
85
Classification Record Number
.
I5834
2002
PERSONAL NAME - PRIMARY RESPONSIBILITY
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International Symposium on Plasma Process-Induced Damage)7th :2002 :Maui, Hawaii(
PERSONAL NAME - ALTERNATIVE RESPONSIBILITY
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Some previous Symposia entitled: International Symposium on Plasma Induced-Damage.
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"P?p2?sID"--Cover.
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"IEEE Catalog Number )softbound( 02TH8582 ; IEEE Catalog Number )CD-ROM( 02TH8582C"--verso of T.p.