عنوان
پدید آورنده
موضوع
رده
QC 702.7 .I55 I59 1984
QC
702
.
7
.
I55
I59
1984
کتابخانه
محل استقرار
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
English
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Ion implantation and beam processing
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Sydney, New York
Name of Publisher, Distributor, etc.
Academic Press
Date of Publication, Distribution, etc.
1984
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xi, 419 p. : ill. ; 24 cm
GENERAL NOTES
Text of Note
Includes bibliographical references and index
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
edited by J.S. Williams, J.M. Poate
ORIGINAL VERSION NOTE
Text of Note
1
TOPICAL NAME USED AS SUBJECT
Entry Element
، Ion implantation
Entry Element
، Ion bombardment
Entry Element
، Semiconductor doping
Entry Element
، Electron beams
LIBRARY OF CONGRESS CLASSIFICATION
Class number
QC
702
.
7
.
I55
I59
1984
OTHER CLASS NUMBERS
Class number
CA
Class number
621
.
3815/2
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
TI
AU Williams, James S.)James Stanislaus( 1948-
AU Poate, J. M.
