عنوان
پدید آورنده
موضوع
رده
621.381531 S947P
621
.
381531
S947P
کتابخانه
محل استقرار
INTERNATIONAL STANDARD BOOK NUMBER
Erroneous ISBN
0-19-856287 x
NATIONAL BIBLIOGRAPHY NUMBER
Country Code
IR
Number
5584
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
انگلیسی
COUNTRY OF PUBLICATION OR PRODUCTlON
Country of publication
IR
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Plasma Etching Fundamentals and Applications
General Material Designation
[Book]
First Statement of Responsibility
/ by M.Sugawara with contributions From Barry L.Stands Field
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Oxford
Name of Publisher, Distributor, etc.
: Oxford University Press
Date of Publication, Distribution, etc.
, 1998.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xiii,347P.
Other Physical Details
:Figure
SERIES
Series Title
(series on semicondator science and technology,7)
GENERAL NOTES
Text of Note
Language: انگلیسی
NOTES PERTAINING TO PUBLICATION, DISTRIBUTION, ETC.
Text of Note
Print
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Bibliography Includes bibliographical references
TOPICAL NAME USED AS SUBJECT
Plasma-etching
Semiconductors-Etching
DEWEY DECIMAL CLASSIFICATION
Number
621
.
381531
S947P
PERSONAL NAME - PRIMARY RESPONSIBILITY
Sugawara,M (Minoru)
PERSONAL NAME - SECONDARY RESPONSIBILITY
StandsField,Barry L
title
ORIGINATING SOURCE
Country
ایران
Agency
دانشگاه اراک
LOCATION AND CALL NUMBER
Call Number
621.381531 S947P
old catalog
p
BL
1
a
Y
