INTERNATIONAL STANDARD BOOK NUMBER
(Number (ISBN
9780125112215
NATIONAL BIBLIOGRAPHY NUMBER
Country Code
IR
Number
EN-56861
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
انگلیسی
COUNTRY OF PUBLICATION OR PRODUCTlON
Country of publication
IR
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Interlayer dielectrics for semiconductor technologies
General Material Designation
[Book]
First Statement of Responsibility
/ edited by S.P. Murarka, M. Eizenberg, A.K. Sinha
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Amsterdam ; Boston
Name of Publisher, Distributor, etc.
: Elsevier/Academic Press,
Date of Publication, Distribution, etc.
, 2003.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xiv, 444 p. , ill. , 25 cm.
NOTES PERTAINING TO PUBLICATION, DISTRIBUTION, ETC.
Text of Note
Electronic
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliographical references (p.425-[427]) and index.
CONTENTS NOTE
Text of Note
Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges. Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package. * Brings together for the FIRST time the science and technology of interlayer deilectrics materials, in one volume * written by renowned experts in the field * Provides an up-to-date starting point in this young research field.
Text of Note
Dialectric Properties, Characterization of Low Dielectric Constant Materials, Compatibilities of Dielectric Film, Silicon Based Dielectrics, Low K Polymers, Chemical Vapour Deposition of CF Low K Materials, Nanoporous Dielectric Films: Fundamental Property Relations and Microelectronic Applications, High K Dielectrics Grown by Atomic Layer Disposition, Dielectric Materials in Optical Waveguide Applications, Reliability, Future Trends in Silicon Technologies.
TOPICAL NAME USED AS SUBJECT
Semiconductor wafers
Dielectrics
Electronic books. , local
LIBRARY OF CONGRESS CLASSIFICATION
Class number
E-BOOK
PERSONAL NAME - SECONDARY RESPONSIBILITY
Murarka, S. P
Eizenberg, M. (Moshe)
Sinha, A. K. (Ashok K.)
ScienceDirect (Online service)
ORIGINATING SOURCE
Country
ایران
ELECTRONIC LOCATION AND ACCESS
Host name
0125112211.pdf
Access number
عادی
Compression information
عادی
Date and Hour of Consultation and Access
0125112211.pdf
Electronic Format Type
متن
old catalog
e
BL
1
a
Y
