INTERNATIONAL STANDARD BOOK NUMBER
(Number (ISBN
0815512201
NATIONAL BIBLIOGRAPHY NUMBER
Country Code
IR
Number
E-2028
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
انگلیسی
COUNTRY OF PUBLICATION OR PRODUCTlON
Country of publication
IR
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Handbook of plasma processing technology
General Material Designation
[Book]
Other Title Information
:fundamentals, etching, deposition, and surface interactions
First Statement of Responsibility
/ edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Park Ridge, N.J., U.S.A.
Name of Publisher, Distributor, etc.
: Noyes Publications,
Date of Publication, Distribution, etc.
, c1990.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xxiii, 523 p. , ill. , 25 cm.
SERIES
Series Title
(Materials science and process technology series.)
NOTES PERTAINING TO PUBLICATION, DISTRIBUTION, ETC.
Text of Note
Print
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliographical references.
CONTENTS NOTE
Text of Note
Microstructural control of plasma-sputtered refractory coatings / David M. Hoffman and Robert C. McCune.
Text of Note
Hollow cathode etching and deposition / Chris M. Horwitz -- Ion platting / Donald M. Mattox -- Ionized cluster beam (ICB) deposition techniques / Isao Yamada -- The activated reactive evaporation (ARE) process / Chandra V. Deshpandey and Rointan F. Bunshah -- Formation of thin films by remote plasma enhanced chemical vapor deposition (Remote PECVD) / Gerold Lucovsky, David V. Tsu and Robert J. Markunas -- Selective bias sputter deposition / Soren Berg and Claes Nender -- Formation of thin films by remote plasma enhanced chemical vapor deposition (Remote PECVD) / Gerold Lucovsky, David V. Tsu and Robert J. Markunas -- Selective bias sputter deposition / Soren Berg and Claes Nender -- Vacuum arc-based processing / David Sanders -- Ion-surface interactions : general understandings / Russell Messier, Joseph E. Yehoda and Lawrence J. Pilione -- Ion assisted deposition / James J. McNally.
Text of Note
Techniques for IC processing / David B. Fraser and William D. Westwood -- Introduction to plasma concepts and discharge configurations / Joseph L. Cecchi -- Fundamentals of sputtering and reflection / David N. Ruzic -- Bombardment-induced compositional change with alloys, oxides, oxysalts, and halides / Roger Kelly -- RF diode sputter etching and deposition / Joseph S. Logan -- Magnetron plasma deposition processes / Stephen M. Rossnagel -- Broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson -- Reactive ion etching / Gottlieb S. Oehrlein -- Reactive sputter deposition / William D. Westwood -- Plasma enhanced chemical vapor deposition of thin films for microelectronics / Rafael Reif -- Electron cyclotron resonance microwave discharges for etching and thin film deposition / Jes Asmussen.
TOPICAL NAME USED AS SUBJECT
Plasma engineering
Semiconductors, Etching
Plasma etching
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TA2020
Book number
.
H37
1990
PERSONAL NAME - SECONDARY RESPONSIBILITY
Rossnagel, Stephen M
Cuomo, J. J
Westwood, William D.(William Dickson),1937-
ORIGINATING SOURCE
Country
ایران
ELECTRONIC LOCATION AND ACCESS
Host name
۴۵۶۳۰۱۲۴۵۸
Access number
عادی
Compression information
عادی
Electronic name
E-2028.DJVU
Bits per second
3716332
Contact for access assistance
مدیر
Electronic Format Type
متن
File size
0
Record control number
E-2028
old catalog
p
BL
1
a
Y
