Menu
Home
Advanced Search
Directory of Libraries
About lib.ir
Contact Us
History
ورود / ثبت نام
عنوان
Chemical vapor deposition: principles and application
پدید آورنده
/ edited by Michael L.Hitchman, Klavs F.Jensen
موضوع
Plasma- Enhanced chemical vapor deposition,Vapor deposition
رده
TS695
.
15
.
C33
1983
کتابخانه
Central Library, Center of Documentation and Supply of Scientific Resources
محل استقرار
استان:
East Azarbaijan
ـ شهر:
تماس با کتابخانه :
04133443834
INTERNATIONAL STANDARD BOOK NUMBER
Qualification
(V.1)
(Number (ISBN
0123496705
NATIONAL BIBLIOGRAPHY NUMBER
Country Code
IR
Number
894
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
انگلیسی
COUNTRY OF PUBLICATION OR PRODUCTlON
Country of publication
IR
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Chemical vapor deposition: principles and application
General Material Designation
[Book]
First Statement of Responsibility
/ edited by Michael L.Hitchman, Klavs F.Jensen
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
London
Name of Publisher, Distributor, etc.
: Academic Press
Date of Publication, Distribution, etc.
, C1983.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
v,677p.
Other Physical Details
: illustration, tables, diagrams
GENERAL NOTES
Text of Note
Language: انگلیسی
NOTES PERTAINING TO PUBLICATION, DISTRIBUTION, ETC.
Text of Note
Print
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes index
TOPICAL NAME USED AS SUBJECT
Plasma- Enhanced chemical vapor deposition
Vapor deposition
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TS695
.
15
Book number
.
C33
1983
PERSONAL NAME - SECONDARY RESPONSIBILITY
Hitchman, Michael L، .Editor
Jensen, Klavs F، .Editor
ORIGINATING SOURCE
Country
ایران
old catalog
p
BL
1
a
Y
Proposal/Bug Report
×
Proposal/Bug Report
×
Warning!
Enter The Information Carefully
Error Report
Proposal