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ورود / ثبت نام
عنوان
Dusty plasmas:physice,chemistry and technological impacts in plasma processing
پدید آورنده
موضوع
Plasma engineering,Plasma(Ionized gases-Industrial applications),Dust,Plasma chemistry,Plasma enhanced chemical vapor deposition
رده
TA2020
.
D88
1999
کتابخانه
Central Library and Documents Center of Mazandaran University
محل استقرار
استان:
Mazandaran
ـ شهر:
Babolsar
تماس با کتابخانه :
62
-
35302861
-
011
NATIONAL BIBLIOGRAPHY NUMBER
Number
7976
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
eng
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Dusty plasmas:physice,chemistry and technological impacts in plasma processing
EDITION STATEMENT
Edition Statement
Edited by Ander Bouchoule
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Chichester
Name of Publisher, Distributor, etc.
: John Wiley.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
viii,408p.
Other Physical Details
:ill
GENERAL NOTES
Text of Note
Language: انگلیسی
NOTES PERTAINING TO PUBLICATION, DISTRIBUTION, ETC.
Text of Note
Print
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliograpical references
TOPICAL NAME USED AS SUBJECT
Entry Element
Plasma engineering
Entry Element
Plasma(Ionized gases-Industrial applications)
Entry Element
Dust
Entry Element
Plasma chemistry
Entry Element
Plasma enhanced chemical vapor deposition
PERSONAL NAME - SECONDARY RESPONSIBILITY
Bouchoule,Andre
old catalog
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