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عنوان
Handbook of plasma processing technology :fundamentals, etching, deposition, and surface interactions
پدید آورنده
edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood
موضوع
، Plasma engineering,Etching ، Semiconductors,، Plasma etching
رده
TA
2020
.
H37
کتابخانه
Central Library and Documents Center of Industrial University of Khaje Nasiredin Toosi
محل استقرار
استان:
Tehran
ـ شهر:
Tehran
تماس با کتابخانه :
88881052
-
88881042
-
021
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Handbook of plasma processing technology :fundamentals, etching, deposition, and surface interactions
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Park Ridge, N.J., U.S.A.
Name of Publisher, Distributor, etc.
Noyes Publications
Date of Publication, Distribution, etc.
c1990
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xxiii, 523 p. : ill
SERIES
Other Title Information
Materials science and process technology series
GENERAL NOTES
Text of Note
Includes bibliographical references
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood
NOTES PERTAINING TO SUBJECT ACCESS
Text of Note
R
ORIGINAL VERSION NOTE
Text of Note
1
Text of Note
2
TOPICAL NAME USED AS SUBJECT
Entry Element
، Plasma engineering
Entry Element
Etching ، Semiconductors
Entry Element
، Plasma etching
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TA
2020
.
H37
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
TI
AU Rossnagel, Stephen M
AU Cuomo, J. J
AU Westwood, William Dickson 1937-
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