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Principles of plasma discharges and materials processing
پدید آورنده
Lieberman, M. A. )Michael A.(
موضوع
، Plasma dynamics,Surfaces ، Thin films,، Plasma etching,Industrial applications ، Plasma chemistry
رده
QC
718
.
5
.
D9
L54
2005
کتابخانه
Central Library and Documents Center of Industrial University of Khaje Nasiredin Toosi
محل استقرار
استان:
Tehran
ـ شهر:
Tehran
تماس با کتابخانه :
88881052
-
88881042
-
021
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Principles of plasma discharges and materials processing
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Hoboken, N.J.
Name of Publisher, Distributor, etc.
Wiley-Interscience
Date of Publication, Distribution, etc.
c2005
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xxxv, 757 p. : ill. ; 25 cm.
GENERAL NOTES
Text of Note
Includes bibliographical references )p. 735-748( and index
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
Michael A. Lieberman, Allan J. Lichtenberg
ORIGINAL VERSION NOTE
Text of Note
2
TOPICAL NAME USED AS SUBJECT
Entry Element
، Plasma dynamics
Entry Element
Surfaces ، Thin films
Entry Element
، Plasma etching
Entry Element
Industrial applications ، Plasma chemistry
LIBRARY OF CONGRESS CLASSIFICATION
Class number
QC
718
.
5
.
D9
L54
2005
PERSONAL NAME - PRIMARY RESPONSIBILITY
Entry Element
Lieberman, M. A. )Michael A.(
Relator Code
AU
AU Lichtenberg, Allan J
TI
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