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Ion implantation: basics to device fabrication
پدید آورنده
Rimini, Emanuele
موضوع
، Ion implantation,، Semiconductor doping,، Semiconductors- Design and construction
رده
QC
702
.
7
.
I55
R56
کتابخانه
Central Library and Documents Center of Industrial University of Khaje Nasiredin Toosi
محل استقرار
استان:
Tehran
ـ شهر:
Tehran
تماس با کتابخانه :
88881052
-
88881042
-
021
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Ion implantation: basics to device fabrication
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Boston
Name of Publisher, Distributor, etc.
Kluwer Academic Publishers
Date of Publication, Distribution, etc.
c1995
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xii, 393 p.: ill
SERIES
Other Title Information
The Kluwer international series in engineering and computer science ; SECS 392.Electronic materials, science and technology
GENERAL NOTES
Text of Note
Includes bibliographical references )p. ]359[-378( and index
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
by Emanuele Rimini
ORIGINAL VERSION NOTE
Text of Note
1
Text of Note
2
TOPICAL NAME USED AS SUBJECT
Entry Element
، Ion implantation
Entry Element
، Semiconductor doping
Entry Element
، Semiconductors- Design and construction
LIBRARY OF CONGRESS CLASSIFICATION
Class number
QC
702
.
7
.
I55
R56
OTHER CLASS NUMBERS
Class number
NO
PERSONAL NAME - PRIMARY RESPONSIBILITY
Entry Element
Rimini, Emanuele
Relator Code
AU
TI
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