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عنوان
Chemical vapor deposition : principles and applications
پدید آورنده
edited by Michael L. Hitchman and Klavs F. Jensen
موضوع
، Chemical vapor deposition
رده
TS
695
.
C54
کتابخانه
Central Library and Documents Center of Industrial University of Khaje Nasiredin Toosi
محل استقرار
استان:
Tehran
ـ شهر:
Tehran
تماس با کتابخانه :
88881052
-
88881042
-
021
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Chemical vapor deposition : principles and applications
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
London ; San Diego
Name of Publisher, Distributor, etc.
Academic Press
Date of Publication, Distribution, etc.
1993
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
v, 677 p. : ill.; 24 cm
GENERAL NOTES
Text of Note
Includes bibliographical references and index
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
edited by Michael L. Hitchman and Klavs F. Jensen
ORIGINAL VERSION NOTE
Text of Note
1
TOPICAL NAME USED AS SUBJECT
Entry Element
، Chemical vapor deposition
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TS
695
.
C54
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
TI
AU Hitchman, Michael L
AU Jensen, Klavs F., 1952-
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