عنوان
پدید آورنده
موضوع
رده
QC702.7.I55 H36 1989eb
QC702
.
7
.
I55
H36
1989eb
کتابخانه
محل استقرار
INTERNATIONAL STANDARD BOOK NUMBER
(Number (ISBN
0815517564
(Number (ISBN
9780815517566
NATIONAL BIBLIOGRAPHY NUMBER
Number
b728365
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Handbook of ion beam processing technology :
General Material Designation
[Book]
Other Title Information
principles, deposition, film modification, and synthesis /
First Statement of Responsibility
edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman.
EDITION STATEMENT
Edition Statement
Reprint ed.
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Park Ridge, N.J., U.S.A. :
Name of Publisher, Distributor, etc.
Noyes Publications,
Date of Publication, Distribution, etc.
©1989.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
1 online resource (xviii, 438 pages) :
Other Physical Details
illustrations
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliographical references and index.
CONTENTS NOTE
Text of Note
Perspective on past, present and future uses of ion beam technology / Jerome J. Cuomo, Stephen M. Rossnagel and Harold R. Kaufman -- Gridded broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson -- Electron cyclotron resonance (ECR) ion sources / William M. Holber -- Hall effect ion sources / Raymond S. Robinson and Harold R. Kaufman -- Ionized cluster bean (ICB) deposition and epitaxy / Isao Yamada and Toshinori Takagi -- Quantitative sputtering / Peer C. Zalm -- Laser- induced fluorescence as a tool for the study of ion beam sputtering / Wallis F. Calaway [and others] -- Characterization of atoms desorbed from surfaces by ion bombardment using multiphoton ionization detection / David L. Pappas, Nicholas Winograd and Fred M. Kimock.
Text of Note
The application of positionization for sputtering studies and surface or thin film analysis / Hans Oechsner -- The modification of films by ion bombardment / Eric Kay and Stephen M. Rossnagel -- Control of film properties by ion-assisted deposition using broad beam sources / Ronnen A. Roy and Dennis S. Yee -- Etching with directed beams / Michael Geis [and others] -- Film growth modification by concurrent ion bombardment : theory and simulation / Karl-Heinz Muller -- Interface structure and thin film adhesion / John Baglin -- Modification of thin films by off-normal incidence ion bombardment / R. Mark Bradley -- Ion beam interactions with polymer surfaces / Robert C. White and Paul S. Ho.
Text of Note
Topography : texturing effects / Bruce A. Banks -- Methods and techniques of ion beam processes / Stephen M. Rossnagel -- Ion-assisted dielectric and optical coatings / Phil J. Martin and Roger P. Netterfield -- Diamond and diamond-like thin films by ion beam techniques / Makoto Kitabatake and Kiyotaka Wasa.
0
0
0
SUMMARY OR ABSTRACT
Text of Note
Encompasses the entire range of industrial refractory materials and forms: properties and their measurement, applications, manufacturing, installation and maintenance techniques, quality assurance, and statistical process control.
OTHER EDITION IN ANOTHER MEDIUM
Title
Handbook of ion beam processing technology.
International Standard Book Number
9780815511991
TOPICAL NAME USED AS SUBJECT
Ion bombardment-- Industrial applications.
Ion implantation.
Bombardement ionique-- Applications industrielles.
Ions-- Implantation.
Ion bombardment-- Industrial applications.
Ion implantation.
TECHNOLOGY & ENGINEERING-- Electronics-- Digital.
TECHNOLOGY & ENGINEERING-- Electronics-- Microelectronics.
(SUBJECT CATEGORY (Provisional
TEC-- 008060
TEC-- 008070
DEWEY DECIMAL CLASSIFICATION
Number
621
.
381/7
Edition
22
LIBRARY OF CONGRESS CLASSIFICATION
Class number
QC702
.
7
.
I55
Book number
H36
1989eb
PERSONAL NAME - ALTERNATIVE RESPONSIBILITY
Cuomo, J. J.
Kaufman, Harold R.
Rossnagel, Stephen M.
ORIGINATING SOURCE
Date of Transaction
20201214083522.0
Cataloguing Rules (Descriptive Conventions))
pn
ELECTRONIC LOCATION AND ACCESS
Electronic name
مطالعه متن کتاب [Book]
Y
