Block copolymer thin films / J.-Y. Wang, S. Park and T.P. Russell -- Equilibration of block copolymer films on chemically patterned surfaces / G.S.W. Craig, H. Kang and P.F. Nealey -- Structure formation and evolution in confined cylinder-forming block copolymers / G.J.A. Sevink and J.G.E.M. Fraaije -- Block copolymer lithography for magnetic device fabrication / J.Y. Cheng and C.A. Ross -- Hierarchical structuring of polymer nanoparticles by self-organization / M. Shimomura [and others] -- Wrinkling polymers for surface structure control and functionality / E.P. Chan and A.J. Crosby -- Crystallization in polymer thin films: morphology and growth / R.M. Van Horn and S.Z.D. Cheng -- Friction at soft polymer surface / M.K. Chaudhury, K. Vorvolakos and D. Malotky -- Relationship between molecular architecture, large-strain mechanical response and adhesive performance of model, block copolymer-based pressure sensitive adhesives / C. Creton and K.R. Shull -- Stability and dewetting of thin liquid films / K. Jacobs, R. Seemann and S. Herminghaus -- Anomalous dynamics of polymer films / O.K.C. Tsui.
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SUMMARY OR ABSTRACT
Text of Note
Polymer thin films is an emerging area driven by their enormous technological potential and the intellectually challenging academic problems associated with them. This book contains a collection of review articles on the current topics of polymer films written by leading experts in the field. To reflect the interdisciplinary nature of this field, the contributors hail from a wide range of disciplines, including chemists, chemical engineers, materials scientists, engineers, and physicists. The goal of this book is to provide readers, whether involved in or outside of the field of polymer films, with an encompassing and informative reference.