Cover; Half Title; Title Page; Copyright Page; Table of Contents; Symbols and abbreviations; Introduction; 1: Overview of the present state and the development of copper vapour lasers and copper vapour laser systems; 1.1. Discovery and first investigations and design of copper vapour lasers; 1.2. The condition and development of CVL in Russia; 1.3. The condition and development of CVL and CVLS in foreign countries; 1.4. The current state and development of the CVL and CVLS in the Istok company; 1.5. Conclusions and results for chapter 1
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2.5 The first domestic experimental laser installation (ELI) Karavella2.6. Conclusions and results for Chapter 2; 3: A new generation of highly efficient and long-term industrial sealed-off active elements of pulsed copper vapour lasers of the Kulon series with a radiation power of 1-20 W and Kristall series with a power of 30-100 W; 3.1. Analysis of the first designs of self-heating AE pulsed CVLs and the reasons for their low durability and efficiency; 3.2. Investigation of ways to increase the efficiency, power and stability of the output radiation parameters of CVL
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2: Possibilities of pulsed copper vapour lasers and copper vapour laser systems for microprocessing of materials2.1. The current state of the modern laser processing equipment for the processing of materials and the place in it of pulsed copper vapour lasers; 2.2. Analysis of the capabilities of pulsed CVL for microprocessing of metallic and non-metallic materials; 2.3 Equipment MP200X of Oxford Laser for microprocessing; 2.4 The main results of the first domestic studies on microprocessing at the Kareliya CVLS and installations EM-5029
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3.3. Choice of directions for the development of a new generation of industrial sealed-off self-heating AE of the CVLs3.4. Appearance and weight and dimensions of industrial sealed-off AEs of the pulsed CVL of the Kulon and Kristall series; 3.5. Construction, manufacturing and training technology, basic parameters and characteristics of industrial sealed-off AEs of the Kulon and Kristall CVL series; 3.6. Conclusions and results for chapter 3
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4: Highly selective optical systems for the formation of single-beam radiation of diffraction quality with stable parameters in copper vapour lasers and copper vapour laser systems4.1. Distinctive properties and features of the formation of radiation in a pulsed CVL; 4.2 Experimental settings and research methods; 4.3. Structure and characteristics of radiation of CVL in single-mirror mode. Conditions for the formation of single-beam radiation with high quality
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SUMMARY OR ABSTRACT
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This reference focuses on the current state of fundamental research and industrial achievements in the field of precision laser processing of a wide range of metal, semiconductor and dielectric materials. The possibilities of microprocessing by pulsed nanosecond laser radiation and copper vapor laser systems are analyzed. Design and operation principles, ways to increase their efficiency and reliability, and a series of modern automated technological installations are described. The work will be of interest to specialists, engineers, students and graduate students working and studying in the field of laser technology and optics, laser and information technology.