عنوان
پدید آورنده
موضوع
رده
QC702.7.M84G35 1996
QC702
.
7
.
M84G35
1996
کتابخانه
محل استقرار
INTERNATIONAL STANDARD BOOK NUMBER
(Number (ISBN
1351453238
(Number (ISBN
9781351453233
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Electron Cyclotron Resonance Ion Sources and ECR Plasmas
General Material Designation
[Book]
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
London :
Name of Publisher, Distributor, etc.
Routledge,
Date of Publication, Distribution, etc.
2018.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
1 online resource (449 pages)
CONTENTS NOTE
Text of Note
Cover; Half Title; Title Page; Copyright Page; Table of Contents; Preface; Acknowledgments; 1: SPECIFIC ELEMENTS OF PLASMA PHYSICS APPLIED TO ELECTRON CYCLOTRON RESONANCE ION SOURCES (ECRIS); 1.1 The breakthrough of the ECRIS and its plasma background; 1.2 Preliminary aspects of plasma at the electron cyclotron resonance; 1.3 Collective plasma phenomena; 1.4 Atomic physics background in ECRIS plasma; 1.5 Motions of charged particles in ECRIS plasma; 1.6 Confinement in magnetic mirror fields; 1.7 The difficult modelling of diffusion processes in magnetoplasmas; 2: WAVE-PLASMA INTERACTIONS
Text of Note
2.1 Basic aspects of small amplitude EM waves incident on a cold magnetoplasma2.2 Specific aspects of waves in warm plasma; 2.3 Electron heating in the ECR plasma; 2.4 Wave launchers and coupling structures; 3: THE ECRIS PLASMA STATES-BREAKDOWN, STEADY STATE AND AFTERGLOW; 3.1 ECRIS breakdown at low pressure in a vacuum cavity; 3.2 ECRIS steady state discharges, a tentative physical analysis; 3.3 Simple magnetic bottle ECRIS; experimental steady state characteristics; 3.4 Min-B ECRIS: steady state electron characteristics; 3.5 ECRIS afterglow regimes (or post-discharge)
Text of Note
4.9 Ion extraction from the ECRIS plasma4.10 Emittance of a source (generalities); 4.11 ECRIS beam emittances; 5: SIMPLE MIRROR AND BUCKET ECRIS FOR LESS HIGHLY CHARGED IONS; 5.1 The history of the first ECR ion sources (1965-1973); 5.2 Modern simple mirror ECRIS; 5.3 Overdense ECRIS at 2.45 GHz for ion beam processing; 5.4 Industrial ECR plasma and ion sources research at Michigan State University; 5.5 ECR plasma cathode (also called microwave plasma cathode); 5.6 ECRIS for specific weakly charged ions; 6: MIN-B ECRIS FOR HIGHLY CHARGED IONS
Text of Note
6.1 A brief history of the development of ECRIS for multiply charged ions6.2 The status of understanding of min-B ECRIS; 6.3 The magnetic structure in modern min-B ECRIS; 6.4 Highly charged metal ions production in min-B ECRIS; 6.5 Specific applications of the min-B ECRIS; 6.6 Scaling rule attempts and practical results; 6.7 Comparative min-B ECRIS; 6 .8 Conclusions and prospects of min-B ECRIS; References; Index
0
8
8
8
SUMMARY OR ABSTRACT
Text of Note
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources.
OTHER EDITION IN ANOTHER MEDIUM
Title
Electron Cyclotron Resonance Ion Sources and ECR Plasmas.
International Standard Book Number
9780750301077
TOPICAL NAME USED AS SUBJECT
Electron cyclotron resonance sources.
Heavy ions.
Plasma (Ionized gases)
Electron cyclotron resonance sources.
Heavy ions.
Plasma (Ionized gases)
DEWEY DECIMAL CLASSIFICATION
Number
539
.
7/33
LIBRARY OF CONGRESS CLASSIFICATION
Class number
QC702
.
7
.
M84G35
1996
PERSONAL NAME - PRIMARY RESPONSIBILITY
Geller, R.
ORIGINATING SOURCE
Date of Transaction
20200822180228.0
Cataloguing Rules (Descriptive Conventions))
pn
ELECTRONIC LOCATION AND ACCESS
Electronic name
مطالعه متن کتاب [Book]
Y
