عنوان
پدید آورنده
موضوع
رده
کتابخانه
محل استقرار
INTERNATIONAL STANDARD BOOK NUMBER
(Number (ISBN
0444596917
(Number (ISBN
9780444596918
Erroneous ISBN
0444899081
Erroneous ISBN
9780444899088
NATIONAL BIBLIOGRAPHY NUMBER
Number
dltt
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Semiconductor materials analysis and fabrication process control
General Material Designation
[Book]
Other Title Information
proceedings of Symposium D on Diagnostic Techniques for Semiconductor Materials Analysis and Fabrication Process Control of the 1992 E-MRS Spring Conference, Strasbourg, France, June 2-5, 1992 /
First Statement of Responsibility
edited by G.M. Crean, R. Stuck, and J.A. Woollam.
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Amsterdam :
Name of Publisher, Distributor, etc.
North-Holland,
Date of Publication, Distribution, etc.
1993.
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
1 online resource (xiv, 338 p.) :
Other Physical Details
ill.
SERIES
Series Title
European Materials Research Society symposia proceedings ;
Volume Designation
v. 34
GENERAL NOTES
Text of Note
"Reprinted from Applied surface science 63"--T.p. verso.
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Includes bibliographical references and indexes.
SUMMARY OR ABSTRACT
Text of Note
There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.
OTHER EDITION IN ANOTHER MEDIUM
Title
Semiconductor materials analysis and fabrication process control.
International Standard Book Number
0444899081
TOPICAL NAME USED AS SUBJECT
Semiconductors-- Analysis, Congresses.
Semiconductors-- Optical properties, Congresses.
Semiconductors-- Quality control, Congresses.
Halbleiter.
Herstellung.
Kongress.
Prozessüberwachung.
SCIENCE / Physics / Electricity.
OTHER CLASS NUMBERS
Class number
33
.
72
Class number
53
.
09
System Code
bcl
System Code
bcl
PERSONAL NAME - ALTERNATIVE RESPONSIBILITY
Crean, G. M.
Stuck, R.
Woollam, John A.
CORPORATE BODY NAME - PRIMARY RESPONSIBILITY
Symposium D on Diagnostic Techniques for Semiconductor Materials Analysis and Fabrication Process Control(1992 :, Strasbourg, France)
CORPORATE BODY NAME - ALTERNATIVE RESPONSIBILITY
European Materials Research Society.
ScienceDirect (Online service)
ORIGINATING SOURCE
Date of Transaction
20140923085400.0
ELECTRONIC LOCATION AND ACCESS
Electronic name
مطالعه متن کتاب [Book]
Y
