عنوان

Materials for microlithography :

(Number (ISBN

0841208719

(Number (ISBN

9780841208711

Number

b428428

Title Proper

Materials for microlithography :

General Material Designation

[Book]

Other Title Information

radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 /

First Statement of Responsibility

L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor

Specific Material Designation and Extent of Item

viii, 494 pages :

Other Physical Details

illustrations ;

Dimensions

24 cm

Series Title

ACS symposium series,

Volume Designation

266

ISSN of Series

0097-6156 ;

Text of Note

Includes bibliographical references and indexes

Text of Note

Fundamental limits of lithography / T.E. Everhart -- Practical and fundamental aspects of lithography / A.N. Broers -- A perspective on resist materials for fine-line lithography / M.J. Bowden -- Fundamental radiation chemistry : fundamental aspects of polymer degradation by high-energy radiation / D.J.T. Hill, J.H. O'Donnell, and P.J. Pomery -- Pulse radiolysis studies on the mechanism of the high sensitivity of chloromethylated polystyrene as an electron negative resist / Y. Tabata, S. Tagawa, and M. Washio -- Photochemistry of ketone polymers in the solid phase : a review / J.E. Guillet, S.-K.L. Li, and H.C. Ng -- Radiolysis of poly(isopropenyl t-butyl ketone) / S.A. Macdonald, H. Ito, C.G. Willson, J.W. Moore, H.M. Gharapetian, and J.E. Guillet -- Polymer-bonded electron-transfer sensitizers / S. Tazuke, R. Takasaki, Y. Iwaya, and Y. Suzuki -- Laser-induced polymerization / C. Decker -- Novel synthesis and photochemical reaction of the polymers with pendant photosensitive and photosensitizer groups / T. Nishikubo, T. Iizawa, and E. Takahashi -- A novel technique for determining radiation chemical yields of negative electron-beam resists / A. Novembre and T.N. Bowmer -- Anomalous topochemical photoreaction of olefin crystals / M. Hasegawa, K. Saigo, and T. Mori -- The photo-Fries rearrangement and its use in polymeric imaging systems / T.G. Tessier, J.M.J. Frechet, C.G. Willson, and H. Ito -- Soluble polysilane derivatives : interesting new radiation-sensitive polymers / R.D. Miller, D. Hofer, D.R. McKean, C.G. Willson, R. West, and P.T. Trefonas, III -- Preparation and resolution characteristics of a novel silicone-based negative resist / A. Tanaka, M. Morita, S. Imamura, T. Tamamura, and O. Kogure -- Positive-working electron-beam resists based on maleic anhydride copolymers / K.U. Pohl, F. Rodriguez, Y.M.N. Namaste, and S.K. Obendorf -- Functionally substituted Novolak resins : lithographic applications, radiation chemistry, and photooxidation / H. Hiraoka -- Synthesis, characterization and lithographic evaluation of chlorinated polymethylstyrene / R. Tarascon, M. Hartney, and M.J. Bowden -- Photochemistry of ketone polymers in the solid phase : thin film studies of vinyl ketone polymers / J.E. Guillet, S.-K.L. Li, S.A. Macdonald, and C.G. Willson -- Polymers of [alpha]-substituted benzyl methacrylates and aliphatic aldehydes as new types of electron-beam resists / K. Hatada, T. Kitayama, Y. Okamoto, H. Yuki, H. Aritome, S. Namba, K. Nate, T. Inoue, and H. Yokono -- Radiation chemistry of phenolic resin containing epoxy and azide compounds / H. Shiraishi, T. Ueno, O. Suga, and S. Nonogaki -- Organic direct optical recording media / L. Alexandru, M.A. Hopper, R.O. Loutfy, J.H. Sharp, P.S. Vincett, G.E. Johnson, and K.Y. Law -- Primary and secondary reactions in photoinitiated free-radical polymerization of organic coatings / A. Hult and B. Ranby -- Radiation stability of silicon elastomers / G.C. Corfield, D.T. Astill, and D.W. Clegg

0

Parallel Title

Radiation-sensitive polymers

Microelectronics-- Materials, Congresses

Microlithography-- Materials, Congresses

Photoresists, Congresses

Polymers, Congresses

Lithography, Congresses

Microelectronics-- Materials, Congresses

Photoresists, Congresses

Polymers, Congresses

Number

Edition

Class number

Book number

Fréchet, Jean M. J

Thompson, L. F.,1944-

Willson, C. G., (C. Grant),1939-

American Chemical Society., Division of Polymer Chemistry

American Chemical Society., Division of Polymeric Materials: Science and Engineering

American Chemical Society., Meeting(187th :1984 :, Saint Louis, Mo.)

Date of Transaction

20160712043835.0

Electronic name

[Book]

Y