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عنوان
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
پدید آورنده
\ Seiji Samukawa
موضوع
Plasma engineering,Plasma etching,مهندسی پلاسما
رده
E-Book
,
کتابخانه
Library of Foreign Languages and Islamic Sources
محل استقرار
استان:
Qom
ـ شهر:
Qom
تماس با کتابخانه :
37839111
INTERNATIONAL STANDARD BOOK NUMBER
(Number (ISBN
:9784431547945
NATIONAL BIBLIOGRAPHY NUMBER
Number
39111
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
انگلیسی
TITLE AND STATEMENT OF RESPONSIBILITY
Title Proper
Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
General Material Designation
[electronic resources]
First Statement of Responsibility
\ Seiji Samukawa
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Tokyo
Name of Publisher, Distributor, etc.
: Springer
Date of Publication, Distribution, etc.
, 2014
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
viii, 40p.
Other Physical Details
:ill.
SERIES
Series Title
SpringerBriefs in Applied Sciences and Technology
INTERNAL BIBLIOGRAPHIES/INDEXES NOTE
Text of Note
Index
Text of Note
Bibliography
TOPICAL NAME USED AS SUBJECT
Plasma engineering
Plasma etching
مهندسی پلاسما
LIBRARY OF CONGRESS CLASSIFICATION
E-Book
,
PERSONAL NAME - PRIMARY RESPONSIBILITY
Samukawa, Seiji
ORIGINATING SOURCE
Country
ایران
ELECTRONIC LOCATION AND ACCESS
Date and Hour of Consultation and Access
9784431547945.pdf
BL
279177
1
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