Image pattern recognition: synthesis and analysis in biometrics
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
Singapore; Hackensack, NJ
Name of Publisher, Distributor, etc.
World Scientific
Date of Publication, Distribution, etc.
c2007
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xxi, 430p: ill.
SERIES
Series Title
Series in machine perception and artificial intelligence
ISSN of Series
v. 67
GENERAL NOTES
Text of Note
"Some of the new ideas were first presented at the international workshop on "Biometric Technologies: Modeling and Simulation" held in June 2004 in Calgary, Canada."--P. vi
Text of Note
Includes bibliographicla references and indexes
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
editors Svetlana N. Yanushkevich ... ]et al.[; consulting editor, Mark S. Nixon
TOPICAL NAME USED AS SUBJECT
Entry Element
Congresses ، Pattern recognition systems
Entry Element
Mathematical models -- Congresses ، Pattern recognition systems