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Ion implantation,sputtering and their applications
پدید آورنده
Townsend, Peter David.
موضوع
، Ion implantation,Sputtering)physics(
رده
QC
702
.
7
.
I55
T67
کتابخانه
Central Library and Information Center of Ferdowsi University of Mashhad
محل استقرار
استان:
Khorasan Razavi
ـ شهر:
Mashhad
تماس با کتابخانه :
05138806503
OTHER STANDARD IDENTIFIER
Standard Number
15975
TITLE AND STATEMENT OF RESPONSIBILITY
First Statement of Responsibility
Townsend, Peter David.
Title Proper
Ion implantation,sputtering and their applications
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
London; New York
Name of Publisher, Distributor, etc.
Academic Press
Date of Publication, Distribution, etc.
1976
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
ix, 333P.:ill.,24 cm
GENERAL NOTES
Text of Note
Includes bibliographies and index
NOTES PERTAINING TO TITLE AND STATEMENT OF RESPONSIBILITY
Text of Note
by P. D. Townsend,J. C. Kelly, N. E. W. Hartley
TOPICAL NAME USED AS SUBJECT
Entry Element
، Ion implantation
Entry Element
Sputtering)physics(
LIBRARY OF CONGRESS CLASSIFICATION
Class number
QC
702
.
7
.
I55
T67
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
AU
AU Kelly, John Clive. Hartley , N. E. W. joint author
AU Hartley, N.E.W joint author
TI
LOCATION AND CALL NUMBER
Call Number Suffix
CL
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