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PVD for microelectronics: sputter deposition applied to semiconductor manufacturing
پدید آورنده
Powell, Ronald A
موضوع
Design and construction ، Thin film devices,، Vapor-plating,، Thin films
رده
TK
7872
.
T55
.
P68
1998
کتابخانه
Central Library of Sharif University of Technology
محل استقرار
استان:
Tehran
ـ شهر:
Tehran
تماس با کتابخانه :
66005817
-
021
OTHER STANDARD IDENTIFIER
Standard Number
133670
LANGUAGE OF THE ITEM
.Language of Text, Soundtrack etc
بهار۲۸
.Language of Text, Soundtrack etc
English
TITLE AND STATEMENT OF RESPONSIBILITY
General Material Designation
)40(
First Statement of Responsibility
Powell, Ronald A
Title Proper
PVD for microelectronics: sputter deposition applied to semiconductor manufacturing
.PUBLICATION, DISTRIBUTION, ETC
Place of Publication, Distribution, etc.
San Diego
Name of Publisher, Distributor, etc.
Academic Press
Date of Publication, Distribution, etc.
1999
PHYSICAL DESCRIPTION
Specific Material Designation and Extent of Item
xiii, 419 p.: ill.; 24 cm
SERIES
Series Title
Thin films
ISSN of Series
v.26
GENERAL NOTES
Text of Note
Includes bibliographical references and indexes
TOPICAL NAME USED AS SUBJECT
Entry Element
Design and construction ، Thin film devices
Entry Element
، Vapor-plating
Entry Element
، Thin films
LIBRARY OF CONGRESS CLASSIFICATION
Class number
TK
7872
.
T55
.
P68
1998
PERSONAL NAME - PRIMARY RESPONSIBILITY
Relator Code
AU
Entry Element
Ronald A. Powell, Stephen M. Rossnagel
AU M nehpetS ,leganssoR
TI
SE
LOCATION AND CALL NUMBER
Shelving Form of Title, Author, Author/Title
04
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