عنوان
پدید آورنده
موضوع
رده
TA 418.9 .N35Y26
TA
418
.
9
.
N35Y26
کتابخانه
محل استقرار
Growth and transport in nanostructured materials : reactive transport in PVD, CVD, and ALD
Cham
Springer
c2017
xi, 128 p.: ill., )some col.(
SpringerBriefs in materials
Includes bibliographies
ISBN: 9783319246703
Angel Yanguas-Gil
1
Transport properties ، Nanostructured materials
، Physical vapor deposition
، Chemical vapor deposition
TA
418
.
9
.
N35Y26
Yanguas-Gil, Angel
AU
SE SpringerBriefs in materials
