Nanoscale phenomena: basic science to device applications
New York
Springer
2008
xiv,248 p. : ill. )some col.(, tables
Lecture notes in nanoscale science and technology ; v. 2
"The Third International Workshop of the Croucher Advanced Study Institute )ASI( on Nano Science and Technology : from Basic Science to Device Applications, was held at Hong Kong University of Science and Technology from 8 January to 12 January 2007. The first and second workshops took place in January 1999, and January 2002, respectively." Preface