9780444537898
IR
EN-38869
انگلیسی
IR
Next Generation of International Chemical Additives : A Critical Review of Current US Patents
[Book]
/ DeRosa, Thomas F.
Elsevier Science
, 2012.
Electronic
ENGINEERING, CHEMICAL
E-BOOK
DeRosa
ایران
Next Generation of International Chemical Additives : A Critical Review of Current US Patents
محرمانه
محرمانه
284088.pdf
متن
old catalog
e
BL
1
a
Y
