(V.1)
0123496705
IR
894
انگلیسی
IR
Chemical vapor deposition: principles and application
[Book]
/ edited by Michael L.Hitchman, Klavs F.Jensen
London
: Academic Press
, C1983.
v,677p.
: illustration, tables, diagrams
Language: انگلیسی
Print
Includes index
Plasma- Enhanced chemical vapor deposition
Vapor deposition
TS695
.
15
.
C33
1983
Hitchman, Michael L، .Editor
Jensen, Klavs F، .Editor
ایران
old catalog
p
BL
1
a
Y
