عنوان
پدید آورنده
موضوع
رده
کتابخانه
محل استقرار
0815517610
9780815517610
b536884
Handbook of physical vapor deposition (PVD) processing :
[Book]
film formation, adhesion, surface preparation and contamination control
by Donald M. Mattox.
Westwood, N.J.
Noyes Publications
©1998.
(xxvii, 945 pages) : illustrations
Preface"; "Contributors"; "Table of Contents"; "1 INTRODUCTION"; "2 SILICIDES AND CONTACTS FOR ULSI"; "3 ALUMINUM BASED MULTILEVEL METALLIZATIONS IN VLSI/ULSICs"; "4 INORGANIC DIELECTRICS"; "5 ORGANIC DIELECTRICS IN MULTILEVEL METALLIZATION OF INTEGRATED CIRCUITS"; "6 PLANARIZATION TECHNIQUES"; "7 LITHOGRAPHY AND ETCH ISSUES FOR A MULTILEVEL METALLIZATION SYSTEM"; "8 ELECTRO- AND STRESS MIGRATION IN MLM INTERCONNECT STRUCTURES"; "9 MULTILEVEL METALLIZATION TEST VEHICLE"; "10 MANUFACTURING AND ANALYTIC METHODS" "11 characterization techniques for vlsi multilevel metallization""12 electronic packaging and its influences on integrated circuit design and processing"; "13 future interconnect systems"; "index"
Covers various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. This book also covers substrate characterization, adhesion, cleaning and processing.
Physical vapor deposition -- Handbooks, manuals, etc.
Physical vapor deposition.
TECHNOLOGY & ENGINEERING -- Technical & Manufacturing Industries & Trades.
by Donald M. Mattox.
D M Mattox
مطالعه متن کتاب [Book]
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