عنوان
پدید آورنده
موضوع
رده
TA2020 .H37 1990eb
TA2020
.
H37
1990eb
کتابخانه
محل استقرار
0815512201
1591242975 (electronic bk.)
9780815512202
9781591242970 (electronic bk.)
b501881
Handbook of plasma processing technology
[Book]
fundamentals, etching, deposition, and surface interactions /
edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
Park Ridge, N.J. :
Noyes Publications,
c1990.
1 online resource (xxiii, 523 p.) :
ill.
Materials science and process technology series.
Includes bibliographical references and index.
An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
Handbook of plasma processing technology.
0815512201
Plasma engineering.
Plasma etching.
Semiconductors-- Etching.
621
.
044
22
TA2020
.
H37
1990eb
Cuomo, J. J.
Rossnagel, Stephen M.
Westwood, William D., (William Dickson),1937-
Knovel (Firm)
20131119105445.0
مطالعه متن کتاب [Book]
Y
