عنوان

EUV sources for lithography

0819458457

1615837167 (electronic bk.)

9780819458452

9781615837168 (electronic bk.)

b503545

EUV sources for lithography

[Book]

[edited by] Vivek Bakshi.

Bellingham, Wash. :

SPIE Press,

c2006.

1 online resource (xxxv, 1057 p.) :

ill.

Includes bibliographical references and index.

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

Knovel Corporation

EUV sources for lithography.

0819458457

Extreme ultraviolet lithography.

Lithography.

Plasma (Ionized gases)

Ultraviolet radiation-- Industrial applications.

Bakshi, Vivek.

Knovel (Firm)

20131119111957.0

[Book]

Y