عنوان
پدید آورنده
موضوع
رده
QC176.A1 P53 v.27
QC176
.
A1
P53
v
.
27
کتابخانه
محل استقرار
0125330278
9780125330275
dltt
Ionized physical vapor deposition /
[Book]
edited by Jeffrey A. Hopwood.
San Diego :
Academic Press,
c2000.
xii, 253 p. :
ill. ;
24 cm.
Thin films ;
v. 27
Includes bibliographical references and indexes.
The role of ionized physical vapor deposition in integrated circuit fabrication / Jeffrey A. Hopwood -- High-density plasma sources / Amy E. Wendt -- Ionization by radio freguency inductively coupled plasma / Steve Rossnagel -- Ionization by microwave electron cyclotron resonance plasma / William M. Holber -- Ionized hollow cathode magnetron sputtering / Kwok F. Lai -- Applications and properties of ionized physical vapor deposition films / John Forster -- Plasma physics / Jeffrey A. Hopwood -- Numerical modeling / Ming Li, Michael A. Vyvoda, and David B. Graves.
0
Physical vapor deposition.
Thin film devices-- Design and construction.
Thin films.
QC176
.
A1
P53
v
.
27
Hopwood, Jeffrey A.
20140220045959.0
مطالعه متن کتاب [Book]
Y
