L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983
ix, 363 pages :
illustrations ;
24 cm
ACS symposium series,
219
0097-6156 ;
Includes bibliographical references and index
An introduction to lithography / L.F. Thompson -- The lithographic process--the physics / L.F. Thompson and M.J. Bowden -- Organic resist materials--theory and chemistry / C. Grant Willson -- Resist processing / L.F. Thompson and M.J. Bowden -- Plasma etching / J.A. Mucha and D.W. Hess -- Multi-layer resist systems / B.J. Lin
0
Microlithography, Congresses
Photoresists, Congresses
Plasma etching, Congresses
Bowden, M. J.,1943-
Thompson, L. F.,1944-
Willson, C. G., (C. Grant),1939-
American Chemical Society., Division of Organic Coatings and Plastics Chemistry
American Chemical Society., Meeting(185th :1983 :, Seattle, Wash.)