Image pattern recognition: synthesis and analysis in biometrics
Singapore; Hackensack, NJ
World Scientific
c2007
xxi, 430p: ill.
Series in machine perception and artificial intelligence
v. 67
"Some of the new ideas were first presented at the international workshop on "Biometric Technologies: Modeling and Simulation" held in June 2004 in Calgary, Canada."--P. vi
Includes bibliographicla references and indexes
editors Svetlana N. Yanushkevich ... ]et al.[; consulting editor, Mark S. Nixon
Congresses ، Pattern recognition systems
Mathematical models -- Congresses ، Pattern recognition systems